微纳加工技术_薄膜制备_氧化与ALD

清疚 2023-01-07 14:28 178阅读 0赞

# 氧化与ALD #

### 文章目录 ###

*  氧化与ALD
 *  常见氧化过程
 *  常见氧化设备
 *   *  多片加工
     *  单片加工
 *  氧化速度
 *  氧化的其他问题
 *   *  1. 杂质与界面的问题
     *  2. B穿透问题
 *  栅氧化层厚度研究
 *  ALD
 *   *  ALD介绍
     *  ALD方法
 *  小结

# 常见氧化过程 #

![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70]

# 常见氧化设备 #

## 多片加工 ##

![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 1]

## 单片加工 ##

上述的氧化炉，热预算比较大，一般需要半小时加热；为减小热预算，使用碘钨灯进行单片加热，加热时间很短，通常以秒计算，降低热预算，如下图；  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 2]  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 3]

# 氧化速度 #

结论：在起初的氧化膜形成厚度为线性，随着氧化膜变厚，后续氧化的速度主要取决于氧气在SiO2中的扩散，厚度逐渐趋近于抛物线；干氧氧化与湿氧氧化相比，湿氧更快，因为水汽更易扩散过SiO2膜，所以反应速率更快；  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 4]

![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 5]  
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![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 8]  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 9]

# 氧化的其他问题 #

## 1. 杂质与界面的问题 ##

碱金属控制，需要严格的清洗；氧化时通少量HCl ，  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 10]  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 11]

## 2. B穿透问题 ##

![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 12]

# 栅氧化层厚度研究 #

栅氧化层厚度与Gate 长度的关系：  
要求：抑制短沟道效应，需要增大栅电容；同时又不减小物理厚度；  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 13]  
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# ALD #

## ALD介绍 ##

ALD: Atomic layer depositon，原子层沉积；原子层沉积是一种可以将物质以单原子膜形式一层一层的镀在基底表面的方法；是一种特殊的CVD技术，与常规CVD的差异是：ALD的反应物都是通过气体供应进来的；

## ALD方法 ##

制备High K 层的方法：ALD； 一个 cycle 只能生产一层原子层，需要反复多次才能生成一层High K膜，一般3nm的膜也就是几十层原子；  
ALD的特点：台阶覆盖性非常好，但生长速度较慢；  
![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 18]

# 小结 #

![在这里插入图片描述][watermark_type_ZmFuZ3poZW5naGVpdGk_shadow_10_text_aHR0cHM6Ly9ibG9nLmNzZG4ubmV0L3dlaXhpbl80NzEzOTY0OQ_size_16_color_FFFFFF_t_70 19]

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